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Hitachi Spherical Aberration Corrected STEM/SEM HD-2700

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Code: #16553

Cs-corrected high-resolution imaging & high-sensitivity analysis with unmatched throughput.

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In the fields ranging from R&D to quality control of advanced nano materials and semiconductor devices, there have been increased demands in recent years for improving spatial resolution and analytical performance for electron microscopes. Aberration correction provides a prominent solution to these demands. Hitachi High-Technologies had previously commercialized electron microscopes equipped with spherical aberration correction capability, since then continued efforts toward pursuing the concept of providing both high throughput and high performance benefited from aberration correction. The HD-2700 STEM with the newly developed Hitachi spherical aberration corrector realized this concept successfully.

Items		Description
		w/o Cs-corrector	w/ Cs-corrector
Image resolution		0.204 nm guaranteed (at a magnification of ×4,000,000)	0.136 nm guaranteed (HAADF-STEM image) 0.105 nm guaranteed (FFT)(at a magnification of ×7,000,000)(HR lens)
Magnification		×100 - ×10,000,000
Accelerating voltage		200 kV, 120 kV , 80 kV
Imaging signal		Bright field STEM: Phase contrast image (TE image) Dark field STEM: Z-contrast image (ZC image) Secondary electron image (SE image) Electron diffraction^* Characteristic X-ray analysis and mapping(EDX)^* EELS analysis and mapping(EV3000)^*
Electron optics	Electron source	Schottky emitter (w/o Cs-corrector)
		Cold field emitter (w/Cs-Correcter,w/o Cs-corrector)
	Illumination lens system	2-stage condenser lens
	Cs-corrector^*	Mullipole transfer lens design
	Scanning coil	2-stage electromagnetic coil
	ZC collection angle control	Projector lens design
	Electromagnetic image shift	±1 µm
Specimen stage	Specimen movement	X/Y = ±1 mm, Z= ±0.4 mm
	Specimen tilt	Single-tilt holder: ±30° (Std. lens), ±18° (HR lens)

High resolution STEM imaging
- HAADF-STEM image 0.136 nm, FFT image 0.105 nm (HR lens*)
- BF STEM image 0.204 nm (w/o Cs-corrector)
High-speed & high-sensitivity EDX analysis: Probe current × 10 times
Elemental mapping in more rapid timely manner Low-concentration element detection
Hitachi in-house Cs-corrector
Equipped with a probe-forming spherical aberration corrector developed by Hitachi, the automatic aberration correction process takes short time and does not need pre-experience for aberration correction.
Seamless solution from sample preparation to observation & analysis.
Holder compatibility with Hitachi FIB

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