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Ion Sputter MC1000

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Code: #16570

Supplier: Hitachi Asia (Vietnam) Co., Ltd.

Diode discharge magnetron type (electric field perpendicular to magnetic field).

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MORE INFORMATION

GENERAL INFORMATION
TECHNICAL PARAMETER

● LCD touch panel makes it easy to set the processing conditions.
● Thick or large specimens can be processed(Option).
● Recipe functions to store commonly used processing conditions.

Item		Description
Discharge	Type	Diode discharge magnetron type (electric field perpendicular to magnetic field)
	Electrode form	Opposed parallel disk (magnet embedded)
	Voltage	0.4 kV DC max. (variable through phase control)
	Current	40 mA DC max.
Coating rate (max.)^12 [Conditions] Pressure : 7 Pa Discharge current : 40 mA Distance between target and specimen surface : 20 mm	Pt target(option)	15 nm/min
	Pt-Pd target (option)	20 nm/min
	Au target (option)	35 nm/min
	Au-Pd target (option)	25 nm/min
Specimen	Max. diameter	Φ60 mm
Specimen	Max. height	20 mm
Rotary pump		135/162 l/min (50/60Hz)
Target^*2		Pt , Pt-Pd (8:2) , Au , Au-Pd (6:4)
Power supply requirements		Single phase, 100 V AC (±10%) 15A (50/60Hz), 3-Pin plug code(3 m)
Dimensions	Width	450 mm
	Depth	391 mm
	Height	390 mm
Weight		Main unit : Approx. 25 kg Rotary pump : Approx. 28 kg

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