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Code: #17670
Supplier: MIDAS SYSTEM CO.,LTD.
Mask Aligner is equipment used in photo-lithography process and the ability to precisely align the photomask and the substrate with the patterned.
Type
Fully manual (Mask Aligner)
Mask size
up to 5" x 5"
Substrate size
piece to 4" dia
UV lamp & Power
UV-LED & power supply
Uniform beam size
125mm dia
Beam Uniformity
<±3%
Beam wavelength
365nm Only
365nm Intensity
~20mW/cm2
Alignment accuracy
1um
Process resolution
1um@1um PR thickness with vacuum contact
Process mode
Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving
x,y,z & θ
Options
etc.
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