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Code: #17655
Supplier: MIDAS SYSTEM CO.,LTD.
Spin coating is a procedure used to deposit uniform thin films onto flat substrates. The spin coater used to apply photoresist to the surface of a silicon wafer.
Type
Spin coater system
Substrate size
piece ~ up to 12" circle / 500x500mm
Rotation speed
300 ~ 5,000rpm / ~2,000rpm (@without load) , Error rate ≤1%
AC Servo Motor
Spin state
50steps, 20recipes (digital type)
Bowl
Stainless steel / Stainless steel, Chuck cover type
Acceleration / Deceleration rate
Variable
Chuck material
Anodized AL, Acetal
Electric power
220V, 5A / 10A
Oilless vacuum pump pressure
-650mmHg
Dimensions (mm)
Customized
Options
Number of Dispenser nozzle
Type of chemical
Drain type
etc.
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