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MIDAS Spin-3000T Spin Coater

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Code: #17653

Supplier: MIDAS SYSTEM CO.,LTD.

Spin coating is a procedure used to deposit uniform thin films onto flat substrates. The spin coater used to apply photoresist to the surface of a silicon wafer.

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  • Type

    Spin coater system

    Substrate size

    piece ~ up to 8" circle

    Rotation speed

    300 ~ 8,000rpm(@without load) an error of less than 1%

    AC Servo Motor(100W/400W)

    Spin state

    50steps, 20recipes (digital type)

    Bowl size

    12", Stainless steel

    Acceleration / Deceleration rate

    Variable

    Chuck material

    Anodized AL, Acetal

    Electric power

    220V, 5A

    Oiless vacuum pump pressure

    650mmHg

    Options

    Number of Dispenser nozzle

    Type of chemical

    Drain type

  • - Touch panel control
    - Compact unit for various coating solutions
    - PC Recipe management
    - Easy operation
    - Adopt Drain, Exhaust hole in bowl

 

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