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Code: #17664
Supplier: MIDAS SYSTEM CO.,LTD.
Mask Aligner is equipment used in photo-lithography process and the ability to precisely align the photomask and the substrate with the patterned.
Type
Joystick control Semi-Auto (Mask Aligner)
Mask size
up to 610 x 610 (User spec.)
Substrate size
500 x 500 (User spec.)
UV lamp & Power
2kW & power supply
5kW & Power supply
Uniform beam size
600 x 600 (User spec.)
Beam Uniformity
<±7%
Beam wavelength
350 ~ 450nm
Process mode
Soft, Hard contact & Proximity
Substrate chuck moving
x,y,z & θ (Motorized)
Frame
Anti-Vibration system
Options
UV Intensity meter
etc.
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