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Code: #17662
Supplier: MIDAS SYSTEM CO.,LTD.
Mask Aligner is equipment used in photo-lithography process and the ability to precisely align the photomask and the substrate with the patterned.
Type
Full automatic (Mask Aligner)
Mask size
up to 14" x 14"
Substrate size
12" circle
UV lamp & Power
5kW lamp & power supply
Uniform beam size
13.25" x 13.25"
Beam Uniformity
<±5%
Beam wavelength
350 ~ 450nm
365nm Intensity
25~60mW/cm2 (5kW)
Alignment accuracy
1um
Process resolution
1um@1um PR thickness with vacuum contact
Process mode
Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving
x,y,z & θ (Motorized)
Pre-aligner
±50um
Frame
Anti-Vibration system
Options
UV Intensity meter
etc.
Multi-Functional Physical Vapo...
Price: Call
Load lock type sputtering syst...
Batch type Thermal evaporation...
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