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Load lock type sputtering system-ZS Series

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Code: #16364

Supplier: ZETONE

Load lock type sputtering system
Substrate pre-cleaning by plasma before deposition
Fullt automated transfer system
Full automation operating(Safety interlick)

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  • Specifications

    Sputtering gun

    4~6 inch

    Deposition direction

    Upward or Downward

    Substrate Type

    glass & water

    Substrate Size

    ~200mm X 200mm

    Sample uniformity

    ≤±3%

    Substrate geater temperature

    ~800℃

    Substrate heater uniformity

    ≤3%

    Process gas

    Ar, O2, N2

    Substrate pre-cleaning by plasma before deposition

    Fullt automated transfer system

    Full automation operating(Safety interlick)

 

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