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Load lock type sputtering system-ZS Series

☆☆☆☆☆ ( 0 rates ) 301

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Code: #16364

Supplier: ZETONE

Load lock type sputtering system

Substrate pre-cleaning by plasma before deposition

Fullt automated transfer system

Full automation operating(Safety interlick)

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Specifications
Sputtering gun	4~6 inch
Deposition direction	Upward or Downward
Substrate Type	glass & water
Substrate Size	~200mm X 200mm
Sample uniformity	≤±3%
Substrate geater temperature	~800℃
Substrate heater uniformity	≤3%
Process gas	Ar, O2, N2
Substrate pre-cleaning by plasma before deposition
Fullt automated transfer system
Full automation operating(Safety interlick)

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