- High precision and high milling rates: The use of a new low aberration ion optical system allows a maximum beam current of 60nA at an accelerating voltage of 40 kV.
- A wide range of beam energies: Operators can choose the optimum operating voltage (or beam energy) for milling and microscopy to best suit the specimen.
- Site specific micro-sampling preparation from bulk samples is achieved in a completely dry vacuum environment allowing preparation of samples free from foreign particles, oxidation, charging and other problems
- Sample Holder Compatibility to Hitachi (S)TEM, SEM allows an easy re-work of pre-prepared specimen if this should be required.