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Advanced Material Analysis and Simulation Software

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Code: #24767

Supplier: Malvern Panalytical Ltd

The analysis toolbox for X-ray scattering data from layered structures.

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  • Advanced Material Analysis and Simulation Software (AMASS) provides comprehensive functionality for displaying, analyzing, simulating and fitting X-ray scattering from layered structures. It supports rocking curves, 2-axes scans, reciprocal space maps of thin heteroepitaxial layers, particularly single-crystal and highly textured thin-layer samples as well as X-ray reflectometry data and off-specular (diffuse) scattering data of arbitrary multi-layer structures. The software offers a wealth of key information, such as mismatch and relaxation, composition and layer thickness, density and roughness and more. These essential thin layer parameters are easily and quickly quantified also by the routine users.
     
    The functionality is covered in AMASS Basic that can be extended by the HR (high-resolution) and the XRR (X-ray reflectivity) simulation and fitting option.

  • - New intuitive graphical user interface.
    - Project-oriented document format for storing, retrieving and managing all information of a work session including open scans, simulated data, all parameters set and used material parameters.
    - Graphics for single scans, area maps and wafer maps.
    - Possibility of merging 1-axis and 2-axes data sets.
    - Projection and extraction from 2-axes scans to generate 1-axis scans for further analysis.
    - Automatic peak search in 1-axis (such as rocking curves) and 2-axes data (such as reciprocal space maps).
    - Automatic peak labelling of substrate, multiple layers and fringes.
    - Automatic horizontal and vertical line extractions at labelled peak positions of 2-axes data.
    - Materials of any space group are supported.
    - Sample structures include gradients, superlattices and linked parameters.
    - Software extracts strain and relaxation, mismatch and composition, substrate miscut orientation and curvature, layer mosaic spread and lateral correlation length, thickness and superlattice period from labelled peak positions.
    - Thickness determination from specular reflectivity data by means of Fourier and direct method.
    - A wafer map can be created by the analysis of any set of scan types. This includes the direct analysis of peak parameters and from peak positions as well as automatic fitting (if the option is available).
    - AMASS supports data in the XRDML format, simple ASCII format (*.asc) as well as the old Philips formats (*.dnn, *.xnn, *.ann and *ynn).
    - Customizable result reporting. PDF, RTF, XML and HTML reports supported.
    - All analysis can be fully automated using a command line interface. When controlled by APP (automatic processing program) automation of the whole process from measurement to result reporting is possible.
    - Component Object Model (COM) interface for operating AMASS features from applications like PhytonTM or Matlab®.
    - Choice of two fitting algorithms: enabling users to tailor the software for unique fitting requirements. (only for the options)
    - Confidence analysis for each parameter of a given sample model. The result of this analysis is a measure of the reliability range of the refined parameter. (only for the options).

 
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