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Sputtering technology

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Code: #29284

Supplier: SJ Nanotech Co., Ltd

- High-energy residual emission and collision/ionization with neutral gas
- Ion acceleration due to positive bias near the target / Collision with the target and transferring momentum through the cathode sheath → Total bias (Vp-Vc): 200 ~ 1000eV by IV characteristics
- Target leaving the lattice and moving to the substrate: 3~10eV
- Secondary electron emission and self-discharge are maintained when ions collide with the target.
- Collision of electrons with surrounding gas, generation of radical and negative ions / Impact of acceleration material along the anode sheath
- Condensation and thin film formation on the surface of the released target particles

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